The International Technology Roadmap for Semiconductors predicts that the silicon-based CMOS transistor technology used by microchips today will run out of steam by the end of the decade, but IBM Research (Yorktown Heights, N.Y.) has a ready replacement already on the drawing board: carbon-based transistors.
IBM paved the way for
commercialization of carbon-based semiconductor chips with its dual-gate
bi-layer graphene field-effect transistors.
Just as all organic substances -- including people -- are
based on carbon compounds, so too will the microchip technologies of the
future, according to IBM. Carbon nanotubes, nanowires and quantum dots are
possibilities for the post-silicon era, but pure crystalline sheets of carbon --
called graphene -- are the closest cousin to the pure crystalline sheets of
silicon from which today's chips are made.
Graphene solves the No. 1 problem with today's silicon chips: Namely, that as we make them smaller and faster, they generate more and more heat. Carbon, on the other hand, harnesses quantum effects to reverse that trend, consuming less and less power as chips are made increasingly smaller and faster.
Graphene sheets also have higher carrier mobilities (the speed at which electrons are propelled by a given voltage). Carrier mobilities that are hundreds of times larger than silicon chips should translate into equally faster chip speeds for graphene.
Unfortunately, in single layers, graphene sheets act more like a conductor than a semiconductor. Semiconductors have a band gap between their conductive state and their insulating state, which allows them to be easily turned on and off. Without a band gap, graphene field-effect transistors (FETs) have dismal on-to-off current ratios that are hundreds of times smaller than silicon.
"Graphene outperforms silicon in terms of carrier mobility, but graphene field-effect transistors have had poor on-to-off current ratios, typically under 10," says IBM Fellow Phaedon Avouris, who oversees its carbon-based materials efforts. "Now we have been able to obtain on-to-off switching ratios of 100 at room temperature, and 2,000 at lower temperatures using our bi-layer graphene FETs."
The key to enhancing graphene's on-to-off ratios, according IBM, was its invention of a bi-layer construction method for graphene transistors. CMOS chips work by suspending a metal gate over a silicon semiconductor channel, but separating from it by an insulating oxide called a dielectric. Then by applying a voltage to the gate, the flow of electrons through the channel can be turned on and off. For graphene, IBM had to design a novel dual-gate stack with an extra layer of a thin polymer to separate the graphene from the dielectric. The extra polymer layer enabled IBM to reduce the scattering of carriers in the graphene, which had formerly been caused by impurities in the oxide. The resulting double-gate structure also allowed IBM to generate the higher electric fields that opened up its band gap.

